Photomask
Photomask using advanced pattern processing technology and the latest equipment.
The photomasks provided by Equa are primarily drawn using the latest equipment that utilizes lasers as the light source. With years of experience in precision photolithography technology and Equa's unique shape processing technology, we meet the diverse needs of our customers in fields such as electronics, optical components, scales, and displays. Equa supports the realization of your images and concepts by creating data from drawings. 【Features】 ○ Supported data: DXF, DWG, GBX, GDS II, and image data such as BMP, TIF, etc. ○ Pattern shapes: Supports straight lines, circles, arcs, as well as sine waves, spirals, and random pattern arrangements. ○ Applications: Precision photolithography for sensors, displays, encoders, semiconductor packages, etc. ○ Shape correction: Flexible shape correction that matches the process. For more details, please contact us or download the catalog.
- Company：エクア
- Price：Other
